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Industrial gas
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目的・用途別
To use nitrogen
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To implant ions
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To form a uniform film on the wafer
To make devices for the entire world
To use helium
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Product List
MOCVD equipment
MOCVD (Metal Organic Chemical Vapor Deposition) equipment refers to the equipment that forms a film for compound semiconductors while using organic metals and gases as raw materials. LEDs, smartphones, and electric vehicles equipped with automated driving systems have dramatically enriched society in recent years. Compound semiconductors are indispensable as the core material for these revolutionary devices, and MOCVD systems like ours is needed for manufacturing compound semiconductors. Our company was the first in the world to introduce self-developed commercial MOCVD systems in 1983. Currently, we research, manufacture, and sell various types of equipment depending on applications (for research, for mass production), materials [GaN (gallium nitride), Ga
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O
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(gallium oxide), GaAs/InP (gallium arsenide/indium phosphide)], size and number of wafer (2 inches x singular/several wafers).
Air Separation Unit
The Air Separation Unit (ASU) is the equipment that compresses, cools, andliquefies air and separates it into oxygen, nitrogen, and argon by distillation. Taiyo Nippon Sanso Corporation was the first company to succeed in the domestic production of air separators in Japan in 1935. The company provides air separators of all sizes,, for all industries, such as steel, electric power, copper refining, chemical, petroleum refining, and glass, utilizing our extensive experience and advanced technical capabilities.
SDS (safe delivery source)
The company provides gas with packaging and capacity appropriately chosen for ion implantation to be used in front-end processes for semiconductors and liquid crystals.
Nitrogen production equipment
Our company has continued to make improvements to our nitrogen generator and promoted advanced performance and serialization since the 1960s. Currently, we meet the needs of all industries with following diverse lineups:
- a standard type developed for general industries such as chemicals, glass, textiles, metals, and food
- a high purity type for the semiconductor industry
- a compact type for smaller-scale demand
Space environment test equipment (space chamber)
Taiyo Nippon Sanso Corporation prides itself on producing space environment test equipment (space simulation chamber) that brings together cryogenic and high-vacuum technologies that faithfully reproduce extreme environments such as the cold darkness/ultra-high vacuum of outer space, and the company offers several chambers in a wide range of areas from extremely small types used for component-level development testing to extra-large types for satellite-wide testing.
Helium liquefaction refrigerator
The company started production and sales of helium liquefiers with a reciprocating engine in 1957, and has delivered various helium liquefiers to many universities and research institutions since then. The company concluded a technology and sales contract with Swiss Linde Kryotechnik AG (formerly Sulzer) in 1977 and is responding to various needs in a wide range of fields by adopting the advanced engineering capabilities of Taiyo Nippon Sanso and Linde's gas bearing expansion turbine.
Helium container
Taiyo Nippon Sanso Corporation has been producing containers that can transport and store 11,000 gallons of liquid helium since 1991. Using Taiyo Nippon Sanso Corporation's ultra-low temperature and vacuum technology involves the use of high-vacuum multi-layer insulation technology that minimizes heat penetration, and special support technology.
Standard gas
The company provides gas according to the calibration of the inspection equipment and measurement conditions for various component gases.
High purity gas
Single component high purity gas in which specified impurities are guaranteed to be below a certain concentration.
N2
Nitrogen is a colorless, tasteless, and odorless gas, and in addition to making up about 78% (volume ratio) of air, it is abundant in nature as nitrogen compounds such as proteins and ammonia. It is chemically inert at room temperature and never combines with any other elements. It is used as a filling gas for metal heat treatment and food using inert properties in addition to the applications to antioxidation and explosion-proofing in semiconductor manufacturing and chemical products. Further, liquid nitrogen is used in frozen food manufacturing equipment, space environment test equipment, and superconducting equipment at a cryogenic temperature of -196°C.
H2
Hydrogen is a combustible gas and is the lightest gas among the elements on earth. Further, its heat conduction is very high, it has low viscosity, and diffuses rapidly. Although there are many methods of manufacturing hydrogen, it is mainly manufactured using fossil fuels such as natural gas and naphtha as raw materials industrially. It is widely used in the field of optical fiber manufacturing and semiconductors in addition to rocket propellant and clean energy for cars.
CO2
Carbon dioxide gas is highly soluble in water (which then becomes carbonated water) and reacts with other substances; however, it is an inert gas that hardly reacts with other substances when dry. High-purity liquefied carbon dioxide can be obtained using by-product gas as the raw material mainly from petrochemicals/petroleum refining or steelworks, etc. Carbonated water and dry ice are familiar in terms of life; however, apart from that, it is used for molding sand molds for casting, carbon dioxide encapsulation welding, paint, solvent, fire extinguishing agent, food storage, sterilization gas, etc.
He
Helium is inert, does not combine with other elements or compounds under normal conditions, and is the coldest gas when in liquid form. Due to its low content in the air, it is produced as a by-product of natural gas that contains more than 0.5% helium when considering manufacturing cost. It is mainly used for cooling electric coils of MRI (Magnetic Resonance Imaging), atmospheric gas for optical fiber sintering, and breathing mixed gas (diving gas), etc.
Ar
Argon is a tasteless and odorless gas and makes up only 0.93% of air. Chemically, it has extremely inert properties that do not combine with other elements even at high temperature and high pressure. Taking advantage of its characteristics, it is used for atmospheric gases, metal refining, etc. in fields such as semiconductors and steel including welding. It is also used for silicon single crystals, which are used as substrates for semiconductors.
O2
Oxygen is a colorless, tasteless, and odorless gas, and makes up about 21% (by volume) of air. It is chemically very active, has strong ability to oxidize (i.e., burn) other matter, and combines with many elements. Also, it plays an integral role in the life support of organisms through breathing. In addition to being used for furnace blowing in the steel industry, etc., using the property of burning and oxidizing, it is used for welding and cutting steel materials, and in oxidation reaction processes in the chemical field. Further, it is used in a wide range of fields such as oxygen inhalation in the medical field, wastewater treatment for environmental measures, and rocket propellants.
Cylinder cabinet
Taiyo Nippon Sanso Corporation provides cylinder cabinets compliant with the High Pressure Gas Safety Act and bulk supply systems for special material gas (BSGS) targeting mass production factories of semiconductors/electronic parts, universities, and research institutes. The company proposes the most suitable cylinder cabinet depending on the type of gas, amount used, and pressure used.
High purity gas purification equipment
Taiyo Nippon Sanso Corporation is the top manufacturer of purification equipment for nitrogen, oxygen, hydrogen, argon, helium, and ammonia. The company offers the best method.
Line purifier
This is an inline small refiner for terminal refining just before semiconductor manufacturing equipment. Various impure components are removed by chemical and physical adsorption, and it purifies special material gases and bulk gases to ultra-high purity.
Adsorption type exhaust gas treatment equipment
The company provides optimal equipment that meets the customer's usage conditions based on the know-how of development, design, and production of exhaust gas treatment equipment (abatement equipment) acquired over the years. Reliable exhaust gas treatment is performed by the combination of dry type abatement agents optimal for gas to be treated in the adsorption type abatement equipment. The company provides a rich lineup, from small scale equipment for research to large equipment for production plants.
Combustion type exhaust gas treatment equipment
The company provides optimal equipment that meets the customer's usage conditions based on the know-how of development, design, and production of exhaust gas treatment equipment (abatement equipment) acquired over the years. Combustion type abatement equipment suppresses by-products (NOx, CO, etc.) of persistent gas such as combustible gas, toxic gas and PFC discharged in the CVD process and etching process, and combusts and decomposes with high efficiency.
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